The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
May. 07, 2002
Adam W. Divelbiss, Wappingers Falls, NY (US);
David C. Swift, Cortlandt Manor, NY (US);
Adam W. Divelbiss, Wappingers Falls, NY (US);
David C. Swift, Cortlandt Manor, NY (US);
Inventqjaya Sdn Bhd, Cyberjaya, MY;
Abstract
The invention is a stereoscopic shutter system having a single liquid crystal (LC) cell. The system may have flexible substrates or non-flexible substrates. The system requires only two electrical conductors to shutter both eyes. The system uses twisted nematic liquid crystal, ferro-electric liquid crystal, pi-cell technology, or other similar shuttering technologies. The system includes only one LC cell, a single large laminated linearly polarizing filter P, and two smaller linear polarizing analyzers oriented in the Pand Pstates. The shutters may be bent into a one-dimensional curved shape about the vertical or horizontal axis.