The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
Nov. 22, 2002
Applicant:
Axel Brintzinger, Dresden, DE;
Inventor:
Axel Brintzinger, Dresden, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/44 ; H01L021/4763 ;
U.S. Cl.
CPC ...
Abstract
A method for fabricating an interconnect on a surface of a passivated substrate includes applying a diffusion barrier to the surface of the passivated substrate and applying a mask to the diffusion barrier. The mask is then patterned to provide an opening for the interconnect. The interconnect is deposited in the opening and the mask is removed. Those portions of the diffusion barrier that are not covered by the interconnect are also removed. The interconnect and what is left of the diffusion barrier are then encapsulated by metal-selective wet-chemical dip coating.