The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
Feb. 02, 2004
Shih-fan Kuan, Taoyuan, TW;
Kuo-chien Wu, Miaoli, TW;
Shih-Fan Kuan, Taoyuan, TW;
Kuo-Chien Wu, Miaoli, TW;
NANYA Technology Corporation, Taoyuan, TW;
Abstract
A method for manufacturing a gate structure has the steps of providing a substrate; forming a conducting layer on the substrate; forming a metal layer on the conducting layer; forming a patterned first protective layer on the metal layer, the protective layer having a side surface; partially removing the side surface of the first protective layer to form a first gate element having a first gate pattern; transferring the first gate pattern to the metal layer to form a second gate element; conformally forming a second protective layer on the first gate element, the second gate element and the conducting layer, causing a second gate pattern; and transferring the second gate pattern to the conducting layer to form a third gate element.