The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
Mar. 20, 2002
Hakeem M. Oluseyi, Los Gatos, CA (US);
Hakeem M. Oluseyi, Los Gatos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method, system, and medium of spectroscopically modeling and/or controlling a semiconductor manufacturing process. The modeling/controlling includes the steps of conducting a plurality of semiconductor manufacturing process runs by changing at least one of process parameters from its target value, and collecting spectral data indicative of the light emitted by plasma during each of said semiconductor manufacturing process runs. The modeling/controlling also includes the step of formulating a ratio based on a relationship between the collected spectral data and the changes in the at least one of the plurality of process parameters.