The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2005

Filed:

Oct. 31, 2001
Applicants:

Liu He, Pleasanton, CA (US);

Sung-soon Park, LA, CA (US);

Haixing Zheng, Oak Park, CA (US);

Grace Tang, Sylmar, CA (US);

Aylin Vance, Reseda, CA (US);

Inventors:

Liu He, Pleasanton, CA (US);

Sung-Soon Park, LA, CA (US);

Haixing Zheng, Oak Park, CA (US);

Grace Tang, Sylmar, CA (US);

Aylin Vance, Reseda, CA (US);

Assignee:

Chemat Technology, Inc., Northridge, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B009/00 ;
U.S. Cl.
CPC ...
Abstract

A radiation-curable anti-reflective coating is disclosed. The coating may be deposited on a substrate by spinning, dipping or rolling. The anti-reflective coating may have two layers in which case the anti-reflective coating has a V-shaped reflectance pattern in the visible wavelength spectrum. The anti-reflective coating may have three layers in which case the anti-reflective coating has a broadband reflectance pattern in the visible wavelength spectrum.


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