The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2005
Filed:
Nov. 07, 2002
Naoki Iwata, Saitama-ken, JP;
Naoki Iwata, Saitama-ken, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
A developing device having a plurality of sleeves is provided for high-speed development and the prevention of an abnormal image, for example, thinning of a line image. An AC bias is effectively applied, so that the base contamination is suppressed to obtain a smooth image without obvious grains. Among the plural sleeves, a bias towards the photoreceptor side is applied to an upstream-side sleeve, and a bias in the reverse direction is applied to a downstream-side sleeve. Alternatively, an AC bias with a low frequency is applied to the upstream-side sleeve and an AC bias with a high frequency is applied to the downstream-side sleeve. In addition, an AC bias with a large amplitude is applied to the upstream-side sleeve, and an AC bias with a small amplitude is applied to the downstream-side sleeve.