The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2005
Filed:
Oct. 02, 2003
Applicant:
Hiroshi Kurosawa, Chiba, JP;
Inventor:
Hiroshi Kurosawa, Chiba, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/42 ;
U.S. Cl.
CPC ...
Abstract
A scanning exposure apparatus for exposing a substrate to a pattern includes an exposure system which exposes the substrate to the pattern with respect to a unit region of the substrate to which the pattern is transferred, a determination system which determines whether a condition of an exposure performed by the exposure system is allowable during the exposure, and a control system which causes the exposure system to continue exposing a remaining region in the unit region of the substrate to the pattern, even after the determination system makes a negative determination for the unit region.