The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2005

Filed:

Apr. 03, 2002
Applicants:

Lisa Dhar, New Providence, NJ (US);

Arturo Hale, New York, NY (US);

Howard Edan Katz, Summit, NJ (US);

Marcia Lea Schilling, Basking Ridge, NJ (US);

Melinda Lamont Schnoes, South Amboy, NJ (US);

Inventors:

Lisa Dhar, New Providence, NJ (US);

Arturo Hale, New York, NY (US);

Howard Edan Katz, Summit, NJ (US);

Marcia Lea Schilling, Basking Ridge, NJ (US);

Melinda Lamont Schnoes, South Amboy, NJ (US);

Assignee:

InPhase Technologies, Longmont, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H001/04 ;
U.S. Cl.
CPC ...
Abstract

The optical article of the invention, e.g., holographic recording medium or polymeric waveguide, is formed by mixing a matrix precursor and a photoactive monomer, and curing the mixture to form the matrix in situ. The reaction by which the matrix precursor is polymerized during the cure is independent from the reaction by which the photoactive monomer is polymerized during writing of data. In addition, the matrix polymer and the polymer resulting from polymerization of the photoactive monomer are compatible with each other. Use of a matrix precursor and photoactive monomer that polymerize by independent reactions substantially prevents cross-reaction between the photoactive monomer and the matrix precursor during the cure and inhibition of subsequent monomer polymerization. Use of a matrix precursor and photoactive monomer that result in compatible polymers substantially avoids phase separation. And in situ formation allows fabrication of articles with desirable thicknesses.


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