The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2005
Filed:
Mar. 18, 2003
Yukihiro Takahashi, Tokyo, JP;
Masakazu Matsumoto, Tokyo, JP;
Yukihiro Takahashi, Tokyo, JP;
Masakazu Matsumoto, Tokyo, JP;
HOYA Corporation, Tokyo, JP;
Abstract
An optical member having improved durability characteristics and a process of producing an optical member are provided. The optical member has an antireflection film on a substrate, wherein an outermost layer of the antireflection film is a layer containing, as a major component, vapor deposited silicon dioxide. The outermost layer is further externally provided with a fluorine-containing water-repellent layer. The optical member has the following characteristics: (1) after the water-repellent layer is initially provided, a stationary contact angle (stationary contact angle before rubbing) to water is 104° or more; and (2) after a chamois skin is dipped in water at 25° C. for 5 minutes, and the surface of the water-repellent layer is then rubbed 10,000 times by the chamois skin while applying a load of 500 g, a stationary contact angle (stationary contact angle after rubbing) is from 0 to 10° smaller than the stationary contact angle before rubbing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile