The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
Jan. 14, 2002
Applicant:
Muguo Chen, Bedford Hills, NY (US);
Inventor:
Muguo Chen, Bedford Hills, NY (US);
Assignee:
eVionX, Inc., Elmsford, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21F009/16 ;
U.S. Cl.
CPC ...
Abstract
A selective polymer-wrapping process is disclosed which is capable of exclusively wrapping radioactive particles from solid waste streams at room temperature. Accordingly, separation of wrapped radioactive particles from unwrapped non-radioactive particles is facilitated. The method includes exposing radioactive particles or material, alone or in combination with other materials, to a precursor monomer solution that is capable of polymerizing due to the inherent radiation of the radioactive material, whereby the radioactive material is partially or totally encapsulated in the resultant polymer.