The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Feb. 20, 2003
Arthur Berman, San Jose, CA (US);
Ying-moh Liu, Saratoga, CA (US);
Arthur Berman, San Jose, CA (US);
Ying-Moh Liu, Saratoga, CA (US);
LightMaster Systems, Inc., Santa Clara, CA (US);
Abstract
A compensated higher order waveplate is constructed of substrates. In one embodiment, a first substrate is a nλ waveplate and the second substrate is a (n+Δ)λ waveplate. The substrates are oriented so that their principle axes of retardation are orthogonal. nλ is a base retardation of a waveplate and Δλ is an incremental retardation. The incremental retardation produces a desired amount of retardation of a lightwave passing through the compensated higher order waveplate. Retarder material used to produce the base retardation is approximately ½ a desired thickness of the waveplate. Multiple waveplates are combined to produce any of wavelength band specific retarders and multiple non contiguous wavelength band specific retarders.