The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Dec. 17, 2003
Applicants:
Robert M. Vavrek, Waukesha, WI (US);
Ricardo Becerra, Waukesha, WI (US);
Ceylan C. Guclu, Waukesha, WI (US);
Inventors:
Robert M. Vavrek, Waukesha, WI (US);
Ricardo Becerra, Waukesha, WI (US);
Ceylan C. Guclu, Waukesha, WI (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G01V003/00 ;
U.S. Cl.
CPC ...
Abstract
The present invention provides for a method for using a silicon dioxide (SiO) material that is equally effective in improving magnetic field homogeneity during MR imaging. The present invention further provides for using silicon dioxide in its granular state. The granular silicon dioxide can then be poured inside a flexible container and the flexible container can be formed to fit any contour of the body.