The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Aug. 06, 2001
Pierre Vanden Brande, B-3090 Overijse, BE;
Alain Weymeersch, B-1300 Wavre, BE;
Pierre Vanden Brande, B-3090 Overijse, BE;
Alain Weymeersch, B-1300 Wavre, BE;
Other;
Abstract
The invention relates to a method of treatment, in particular cleaning and/or heating, for a metal substrate () fed in a substantially continuous manner through a vacuum chamber (), having a treatment zone in which an electric discharge (), i.e. a plasma, and a magnetic field are produced in a gas maintained at a pressure below atmospheric pressure between at least the substrate (), acting as an electrode, and at least one counter-electrode () to enable the substrate () to be bombarded by the ions produced in the electric discharge (). This method is characterised in that a confining magnetic induction field is produced entirely around the substrate () in the treatment zone so that the electric discharge () is also confined entirely around the substrate () inside this treatment zone by the confinement of electrons released in the electric discharge ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile