The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Dec. 31, 2003
Kazuhiko Asakawa, Miyagi, JP;
Kazuhiko Asakawa, Miyagi, JP;
Oki Electric Industry Co., Ltd., Tokyo, JP;
Abstract
A method for manufacturing a semiconductor element of the present invention includes the steps of: forming, on a substrate, a protection oxide film, a nitride film, an insulation film for protecting the nitride film; forming a trench; etching the insulation film to widen its aperture toward an active region; forming a thermal oxidation film inside the trench; etching the nitride film using the insulation film as a mask to slide a step defined by the thermal oxidation film and the nitride film from an upper edge of the trench toward the active region; forming a filling oxide film; exposing the nitride film; etching the filling oxide film; and removing the nitride oxide film and the protection oxide film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile