The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6933233 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 23, 2005

Filed:

Mar. 07, 2003
Applicants:

Makoto Yonebayashi, Kyoto, JP;

Hideaki Miyamoto, Kyoto, JP;

Tetsuo Shimizu, Kyoto, JP;

Inventors:

Makoto Yonebayashi, Kyoto, JP;

Hideaki Miyamoto, Kyoto, JP;

Tetsuo Shimizu, Kyoto, JP;

Assignee:

Stec, Inc., Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/302 ;
U.S. Cl.
CPC ...
Abstract

A liquid material supply system in which an inert gas is injected into a material tank accommodating a liquid material so as to discharge the liquid material into a liquid material discharge pipe connected to the material tank and that the inert gas dissolved or mixed in the discharged liquid material is trapped by a gas trap provided on the liquid material discharge pipe, is constructed in such a manner that when a dissolution temperature characteristic of the inert gas with respect to the liquid material is negative, an upstream side of the liquid material discharge pipe with respect to the gas trap is heated while the downstream side of the liquid material discharge pipe with respect to the gas trap is cooled.


Find Patent Forward Citations

Yonebayashi, Makoto. (2005). Liquid material supply system and method for semiconductor manufacturing (U.S. Patent No. 6933233). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6933233

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