The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Oct. 13, 2003
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Sivananda K. Kanakasabapathy, Hopewell Junction, NY (US);
Ihar Kasko, Fishkill, NY (US);
Greg Costrini, Hopewell Junction, NY (US);
John P. Hummel, Millbrook, NY (US);
Michael C. Gaidis, Wappingers Falls, NY (US);
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Sivananda K. Kanakasabapathy, Hopewell Junction, NY (US);
Ihar Kasko, Fishkill, NY (US);
Greg Costrini, Hopewell Junction, NY (US);
John P. Hummel, Millbrook, NY (US);
Michael C. Gaidis, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for aligning an opaque, active device in a semiconductor structure includes forming an opaque layer over an optically transparent layer formed on a lower metallization level, the lower metallization level including one or more alignment marks formed therein. A portion of the opaque layer is patterned and opened corresponding to the location of the one or more alignment marks in the lower metallization level so as to render the one or more alignment marks optically visible. The opaque layer is then patterned with respect to the lower metallization level, using the optically visible one or more alignment marks.