The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2005

Filed:

Oct. 14, 2003
Applicants:

Rajiv Pethe, San Jose, CA (US);

Pramod Gupta, Cupertino, CA (US);

Xianhai Chen, San Jose, CA (US);

Alexander Nagy, Santa Cruz, CA (US);

Inventors:

Rajiv Pethe, San Jose, CA (US);

Pramod Gupta, Cupertino, CA (US);

Xianhai Chen, San Jose, CA (US);

Alexander Nagy, Santa Cruz, CA (US);

Assignee:

Photon Dynamics, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C014/02 ; C23C014/06 ; G02F001/061 ;
U.S. Cl.
CPC ...
Abstract

In order to allow application of any coating under a vacuum over a volatile gelatinous layer, such as polymer dispersed liquid crystal (PDLC) on an optical glass substrate with a transparent electrode, such as indium tin oxide (ITO) on its surface, a layer of an intermediate stress absorbing polymeric material is first applied to cover the volatile gelatinous layer to prevent evaporation and escape of volatiles, thereafter the coating is applied under a very high vacuum using for example a technique called Physical Vapor Deposition (PVD) or sputtering.


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