The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Oct. 16, 2002
Applicant:
Maki Hamaguchi, Kobe, JP;
Inventor:
Maki Hamaguchi, Kobe, JP;
Assignee:
Kobe Steel, Ltd., Kobe, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C016/00 ; H05B006/10 ;
U.S. Cl.
CPC ...
Abstract
A heating apparatus which is installed in a low pressure CVD system or annealing equipment for use in semiconductor integrated circuit manufacturing processes for heat-treating wafers on which IC's are to be formed, wherein wafers are uniformly heated, the temperature of wafers is rapidly raised and lowered, and wafers are processed in high volume, wherein the apparatus comprises a cylindrical body made of glass-like carbon placed inside a reactor, and a high-frequency induction coil which is placed outside the reactor and is for causing the cylindrical body made of glass-like carbon to produce heat and thereby heating wafers in the reactor.