The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Jul. 10, 2000
Claude L. Davis, Jr., Painted Post, NY (US);
Kenneth E. Hrdina, Horseheads, NY (US);
Claude L. Davis, Jr., Painted Post, NY (US);
Kenneth E. Hrdina, Horseheads, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system () for producing and directing an extreme ultraviolet soft x-ray radiation λ from an extreme ultraviolet soft x-ray source (); a mask stage () illuminated by the extreme ultraviolet soft x-ray radiation λ produced by illumination stage and the mask stage () includes a pattern when illuminated by radiation λ. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface () and printed media subject wafer which has a radiation sensitive surface.