The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2005

Filed:

Sep. 27, 2002
Applicant:

Takeshi Yamawaki, Tokyo, JP;

Inventor:

Takeshi Yamawaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B026/08 ;
U.S. Cl.
CPC ...
Abstract

A multi-beam light scanning optical system includes n (n≧2) light source means having m (m≧2) light emitting points; beam synthesizing means for synthesizing n×m light beams emitted by the light source means; deflecting means for deflecting n×m light beams from the beam synthesizing means; an imaging optical system for imaging the n×m light beams from the deflecting means on a surface to be scanned, wherein the surface to be scanned is scanned in a main scan direction with n×m light beams by a deflection scanning operation of the deflecting means; an aperture stop provided between the beam synthesizing means and the deflecting means, wherein principal rays of the n×m light beams are intersected at a position of the aperture stop, and the light beams which are adjacent to each other in a sub-scan direction on the surface to be scanned are the beams emitted from different ones of the light source means.


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