The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Mar. 07, 2003
Gang Xiao, Barrington, RI (US);
Benaiah D. Schrag, Providence, RI (US);
Gang Xiao, Barrington, RI (US);
Benaiah D. Schrag, Providence, RI (US);
Brown University Research Foundation, Providence, RI (US);
Abstract
A scanning magnetic microscope (SMM) () includes a current source () for imposing an excitation current to a conductor-under-test (CUT) () and, if applicable, a reference current to a proximally located reference conductor (). During accelerated testing, the SMM () corrects thermal drift of the CUT () via the reference conductor (). A sensor () may be cooled by a heat sink () such as a pump () directing an airstream or a coldfinger (). The sensor may switch from a contact to a non-contact mode of scanning the CUT (). The SMM () and methods are useful for measuring electromigration in a CUT () as it occurs, for assembling the images into time lapsed representations such as a shape of the CUT (), for measuring electromigration as a function of a cross sectional area of a wire under a dielectric material (DM) (), for determining electrical parameters of the CUT (), and for optimizing a thickness of a DM () over a CUT (). The SMM () and methods are further useful for measuring morphological changes in a CUT () due to other stressing conditions, such as temperature, excitation current, physical stress(es), hostile environment, aging, semiconductor 'burn-in', or irradiation.