The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Sep. 04, 2003
Applicants:
Manfred Friedrich, Dresden, DE;
Horst Tyrroff, Stolpen, DE;
Inventors:
Manfred Friedrich, Dresden, DE;
Horst Tyrroff, Stolpen, DE;
Assignee:
Forschungszentrum Rossendorf e.V., Dresden, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C014/34 ;
U.S. Cl.
CPC ...
Abstract
A sputter ion source includes an ionizer; a sputter cathode, including a cathode, a sputter insert, and a shielding cap; a forming electrode; cathode insulator; a hollow, cylindrical shielding cathode, surrounding the sputter cathode, and tapered rotationally symmetrically in the region of the sputter insert; and a vacuum-tight housing for enclosing all of the foregoing. The sputter ion source has a prolonged operating life, low maintenance costs, and prevents atomization of parts of the ion source, for generating negative ions, in the vicinity of the cathode insert.