The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Sep. 03, 2002
Olaf Storbeck, Dresden, DE;
Ralph Trunk, Bischberg, DE;
Lothar Pfitzner, Erlangen, DE;
Claus Schneider, Bubenreuth, DE;
Olaf Storbeck, Dresden, DE;
Ralph Trunk, Bischberg, DE;
Lothar Pfitzner, Erlangen, DE;
Claus Schneider, Bubenreuth, DE;
Infineon Technologies AG, Munich, DE;
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung E.V., Munich, DE;
Abstract
A configuration for measuring the concentration of contaminating particles at high time resolution in the mini environments of loading and unloading chambers of processing appliances in semiconductor fabrication includes a probe, a movement unit for the probe, a particle detector, vacuum pump and a control unit. Reaching critical layer thicknesses of disk carriers or boats in ovens, and maladjustments of handling systems for wafers, masks, flat panel displays and other disc-like objects can be detected in terms of the cause and quantified immediately. The movement unit moves the probe to a desired position in the loading and unloading chamber as a reaction to the positioning of the handling system. A method of operating the configuration is also provided.