The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2005
Filed:
May. 07, 2004
Martin E. Lee, Saratoga, CA (US);
Martin E. Lee, Saratoga, CA (US);
Nikon Corporation, Tokyo, JP;
Abstract
A mask having a mask pattern is provided on a mask table. A substrate is provided on a substrate table. The mask is irradiated to project an image of at least a portion of the mask pattern onto a radiation-sensitive layer of the substrate using a projection system. At least one of the mask and substrate tables is positioned using a drive unit having a stationary part coupled to a reaction frame. A position of at least one of the mask and substrate tables is measured using a measuring system having a plurality of measurement sensors that have a stationary part and a movable part. The movable part of one of the sensors is coupled to the one of the mask table and the substrate table whose position is measured, and the stationary parts of the sensors are coupled to a support frame mechanically isolated from the reaction frame.