The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2005
Filed:
Dec. 20, 2002
Hyang Yul Kim, Kyoungki-do, KR;
Seung Hee Lee, Kyoungki-do, KR;
Hyang Yul Kim, Kyoungki-do, KR;
Seung Hee Lee, Kyoungki-do, KR;
Boe-Hydis Technology Co., Ltd., Kyoungki-do, KR;
Abstract
The present invention relates to a method for forming post spacers in a liquid crystal display, which enables cell gap to be uniform by means of a half-tone mask. The method comprises the steps of: defining a active region and a dummy region in a substrate; forming a black matrix on the substrate at the outside of the active region; selectively forming a RGB resin film on the active region while selectively forming a RGB resin film on the dummy region; forming a protective film on the resulting structure; forming a photosensitive resin film on the protective film; forming a half-tone mask pattern on the photosensitive resin film; and selectively etching the photosensitive resin film using the half-tone mask pattern so as to form the post spacers having a different height.