The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2005
Filed:
Jun. 25, 2001
Steven Verhaverbeke, San Francisco, CA (US);
J. Kelly Truman, Morgan Hill, CA (US);
Steven Verhaverbeke, San Francisco, CA (US);
J. Kelly Truman, Morgan Hill, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention is a novel cleaning method and a solution for use in a single wafer cleaning process. According to the present invention the cleaning solution comprises ammonium hydroxide (NHOH), hydrogen peroxide (HO), water (HO) and a chelating agent. In an embodiment of the present invention the cleaning solution also contains a surfactant. And still yet another embodiment of the present invention the cleaning solution also comprises a dissolved gas such as H. In a particular embodiment of the present invention, this solution is used by spraying or dispensing it on a spinning wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile