The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2005
Filed:
Apr. 22, 2003
Marcus Morstein, Grenchen, CH;
Tibor Cselle, Grenchen, CH;
Pavel Holubar, Sumperk, CZ;
Mojmir Jilek, Sumperk, CZ;
Peter Blösch, Biel, CH;
Marcus Morstein, Grenchen, CH;
Tibor Cselle, Grenchen, CH;
Pavel Holubar, Sumperk, CZ;
Mojmir Jilek, Sumperk, CZ;
Peter Blösch, Biel, CH;
PIVOT a.s., Novy Malin, CZ;
Abstract
A method is provided for coating objects in a vacuum chamber in which a physical vapor deposition (PVD) can be carried out. The chamber has at least one anode means, at least one cathode and at least one magnetic field source. An arc can be ignited between the at least one anode means and the at least one cathode, and the cathode separates material. The at least one magnetic field can be turned relative to the at least one cathode and the objects to be coated are arranged in the chamber. The magnetic field is turned before the beginning of the coating process so that the separated material does not coat the objects to be coated in the coating process. The arc for the physical deposition process is produced by means of at least two cathodes, said cathodes are constructed as substantially cylindrical tubular cathodes and the at least one magnetic field source is constructed as a permanent or coil magnet arranged in the tubular cathodes and the tubular-cathodes turn about their cylinder axis during the coating process.