The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Apr. 01, 2003
Applicants:
Yong-seok Park, Seoul, KR;
Han-beom JO, Euiwang, KR;
Inventors:
Yong-Seok Park, Seoul, KR;
Han-beom Jo, Euiwang, KR;
Assignee:
Display Manufacturing Service Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/42 ; G03F009/00 ;
U.S. Cl.
CPC ...
Abstract
Provided are a large-area mask and an exposure system having the same. The mask includes a transparent substrate, which includes a light transmission region and a light-blocking region, and a plurality of bars, which is arranged on the substrate to support the substrate. When the large-area mask is installed on the exposure system, the bars can support the mask, thus preventing downward level shifting of the mask.