The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Feb. 11, 2003
Makoto Ikeda, Kanagawa-ken, JP;
Makoto Ikeda, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A system for instructing allocation of a plurality of exposure units, having a selector configured to select a first exposure unit to be employed in a process of forming a first exposure pattern on an objective substrate among the exposure units, a mix-and-match unit configured to compute overlay correction values for canceling differences in stage and lens characteristics between the first exposure unit and a second exposure unit that is employed in a process of forming a second exposure pattern on the objective substrate, an allocation commander configured to instruct to allocate the first exposure unit for the objective substrate prior to another substrate scheduled for the first exposure unit, and a storage unit configured to store data concerning the stage and lens characteristics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile