The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Jun. 27, 2001
Masami Ishihara, Saitama, JP;
Motoshige Sumino, Saitama, JP;
Kazuhito Fukasawa, Saitama, JP;
Naoki Katano, Saitama, JP;
Shigeaki Imazeki, Saitama, JP;
Masami Ishihara, Saitama, JP;
Motoshige Sumino, Saitama, JP;
Kazuhito Fukasawa, Saitama, JP;
Naoki Katano, Saitama, JP;
Shigeaki Imazeki, Saitama, JP;
Wako Pure Chemical Industries, Ltd., Osaka, JP;
Abstract
A compound shown by the general formula [1](wherein R, Rand Rare each independently an aromatic hydrocarbon residual group, Yis an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R, Rand Reach is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.