The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Aug. 05, 2002
Taisuke Hirooka, Kobe, JP;
Taisuke Hirooka, Kobe, JP;
Neomax Co., Ltd., Osaka, JP;
Abstract
A method of recording different identifiers, each including at least one character, on multiple plate-type members, involves the use of a photomask of a first type and at least two photomasks of a second type. The photomask of the first type has an opaque pattern that defines a blank region to write the identifier thereon. Each of the photomasks of the second type has an opaque pattern defining the at least one character. The method further includes the steps of forming a photoresist layer on the surface of one of the plate-type members, exposing the photoresist layer, except the blank region, to a radiation through the photomask of the first type, and forming a latent image of the at least one character in the blank region through at least one of the photomasks of the second type.