The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Mar. 27, 2003
Yehoshua Yeshurun, Haifa, IL;
Meir Hefetz, Mitzpe Harashim, IL;
Erwin Berenschot, Winterswijk, NL;
Meint DE Boer, Enschede, NL;
Dominique Maria Altpeter, Hengelo, NL;
Garrit Boom, Vriezenveen, NL;
Yehoshua Yeshurun, Haifa, IL;
Meir Hefetz, Mitzpe Harashim, IL;
Erwin Berenschot, Winterswijk, NL;
Meint de Boer, Enschede, NL;
Dominique Maria Altpeter, Hengelo, NL;
Garrit Boom, Vriezenveen, NL;
Nano Pass Technologies Ltd., Haifa, IL;
Abstract
A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-irradiated region. The method also including developing the first layer so as to selectively remove one of the at least one irradiated region and the at least one non-irradiated region such that, at least part of at least one remaining region at least partially defines a form of at least part of a microneedle structure. A microneedle structure including a plurality of microneedles at least partially formed from a radiation sensitive polymer.