Substrate processing apparatus and method for manufacturing semiconductor device

Abstract

A substrate processing apparatus and a method for manufacturing a semiconductor device can supply the vapor of the raw material to the substrate without fail. A main heateris prepared outside the outer tube, an inner tubeis prepared inside the outer tube, a capthat can be lifted and lowered is inserted in the inner tube, a boatis mounted on the cap, a raw material sublimation portionand a heat insulating portionare prepared on the cap, a heater portionis set up with possible attachment and detachment on the cap, a sublimation heaterof the heater portionis located inside the reaction chamber, a raw material loading boardof the raw material sublimation portionis prepared on the upper portion of the sublimation heater, a plurality of pole membersare prepared around the raw material loading board, the heat insulation portionis supported by the pole member, and the heat insulating portionis located between the raw material sublimation portionand the substrate processing area, and the heat insulating portionis packed with a quartz wool.