The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Jul. 31, 2001
Arthur J. Neufeld, San Diego, CA (US);
Ehren J. D. Van Melle, San Diego, CA (US);
Eric Handojo, Carlsbad, CA (US);
Arthur J. Neufeld, San Diego, CA (US);
Ehren J. D. Van Melle, San Diego, CA (US);
Eric Handojo, Carlsbad, CA (US);
Qualcomm Inc, San Diego, CA (US);
Abstract
Techniques to generate a pseudo-random number (PN) sequence at a desired phase using 'masking' to adjust the phase of the PN sequence in coarse increments (e.g., 64-PN chip increments) to account for a large phase adjustment. Slewing may then be used to adjust the PN phase in fine increments (e.g., ⅛ PN chip increments) to obtain the desired phase. Prior to each scan for the pilot from a particular base station, a PN mask corresponding to a phase closest to the start of a new search window is applied to a PN generator to obtain an initial phase for the PN sequence. From the initial phase obtained by the applied mask, the PN generator is then slewed to the start of the search window. The masking can be used to obtain a large phase adjustment in less time, which is likely to improve search performance.