The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Oct. 24, 2003
Brian K. Kirkpatrick, Allen, TX (US);
Clint L. Montgomery, Coppell, TX (US);
Brian M. Trentman, Sherman, TX (US);
Randall W. Pak, Plano, TX (US);
Brian K. Kirkpatrick, Allen, TX (US);
Clint L. Montgomery, Coppell, TX (US);
Brian M. Trentman, Sherman, TX (US);
Randall W. Pak, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides a process of manufacturing a semiconductor device that comprises a process of manufacturing a semiconductor device that includes plasma etchingthrough a patterned hardmask layerlocated over a semiconductor substratewherein the plasma etching forms a modified layeron the hardmask layer, and removing at least a substantial portion of the modified layerby exposing the modified layerto a post plasma clean process.