The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Apr. 13, 2004
Applicant:
Hideaki Matsuhashi, Tokyo, JP;
Inventor:
Hideaki Matsuhashi, Tokyo, JP;
Assignee:
Oki Electric Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/8242 ; H01L021/20 ;
U.S. Cl.
CPC ...
Abstract
A method of manufacturing a capacitor having a couple of electrodes with a dielectric placed therebetween. At least one of the electrodes is made of copper, and barriers for preventing the diffusion of copper into the dielectric are provided between the dielectric and the copper electrode, respectively.
Quick Actions:
Matsuhashi, Hideaki. (2005). Method of manufacturing a capacitor with copper electrodes and diffusion barriers (U.S. Patent No. 6921689). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6921689
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