The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Sep. 06, 2002
Wei Qian, Torrance, CA (US);
Dazeng Feng, Arcadia, CA (US);
Dawei Zheng, Los Angeles, CA (US);
Joan Yiqiong Fong, San Marino, CA (US);
Zhian Shao, Torrance, CA (US);
Lih-jou Chung, Anaheim, CA (US);
Xiaoming Yin, Pasadena, CA (US);
Wei Qian, Torrance, CA (US);
Dazeng Feng, Arcadia, CA (US);
Dawei Zheng, Los Angeles, CA (US);
Joan Yiqiong Fong, San Marino, CA (US);
Zhian Shao, Torrance, CA (US);
Lih-Jou Chung, Anaheim, CA (US);
Xiaoming Yin, Pasadena, CA (US);
Kotura, Inc., Monterey Park, CA (US);
Abstract
A method of forming an optical component includes forming a first mask on an optical component precursor. The first mask is formed with a plurality of waveguide portions extending from a common portion. Each waveguide portion is positioned so as to protect a waveguide region of the optical component precursor where a waveguide is to be formed. The method also includes forming a second mask between waveguide portions of the first mask. The resistance of the second mask to etching varies along at least one dimension of the second mask.