The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Mar. 25, 1999
Stephen N. Davies, Over, GB;
Timothy G. J. Jones, Cambridge, GB;
Silke Olthoff, Cambridge, GB;
Gary J. Tustin, Cambridge, GB;
Stephen N. Davies, Over, GB;
Timothy G. J. Jones, Cambridge, GB;
Silke Olthoff, Cambridge, GB;
Gary J. Tustin, Cambridge, GB;
Schlumberger Technology Corporation, Sugar Land, TX (US);
Abstract
A method to reduce water influx into a producing well is described comprising the steps of pumping a chemical composition into a production interval and into surrounding formation; said composition being capable of forming, firstly, a physically stabilized structure and, secondly, a chemically stabilized structure, wherein said physically stabilized structure being dissolvable by hydrocarbon containing fluids; letting said composition form said physically stabilized structure within the formation surrounding said production interval; changing pressure condition in said production interval such that the fluid flow within the surrounding formation is reversed; letting thereby in some portions of the formation hydrocarbon containing fluids dissolve said physically stabilized structure and chemically stabilize said structure in the remaining portions by a cross-linking reaction. The time constants of the two stabilizing reactions are selected such that the physical stabilization is essentially completed before the pumping direction is reversed and the chemical stabilization is essentially completed after the pump-out/cleaning operation.