The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2005

Filed:

Apr. 14, 2003
Applicants:

Shigeaki Nimura, Chiba, JP;

Masanori Kobayashi, Kanagawa, JP;

Hiroyuki Sugimoto, Kanagawa, JP;

Yasuyuki Takiguchi, Kanagawa, JP;

Toshiaki Tokita, Kanagawa, JP;

Yumi Matsuki, Kanagawa, JP;

Inventors:

Shigeaki Nimura, Chiba, JP;

Masanori Kobayashi, Kanagawa, JP;

Hiroyuki Sugimoto, Kanagawa, JP;

Yasuyuki Takiguchi, Kanagawa, JP;

Toshiaki Tokita, Kanagawa, JP;

Yumi Matsuki, Kanagawa, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F001/03 ; G02F001/07 ;
U.S. Cl.
CPC ...
Abstract

An optical path deflecting element, an optical path deflecting apparatus, an image displaying apparatus, an optical writing apparatus, an optical interconnection apparatus, an optical element, and a fabrication method thereof. The optical path deflecting element includes a pair of transparent substrates, transparent electrode films on the substrates to which a voltage having an inverse polarity is selectively applied, an alignment layer in the inner sides of the substrates, and a liquid crystal layer formed of a chiral smectic C phase between the substrates via the alignment layer and homogeneously aligned by the alignment layer. The optical deflecting element can realize the uniformly-aligned liquid crystal layer more easily than a case in which the liquid crystal is aligned to become in a bistable condition. For this reason, it is possible to improve yield in the fabrication.


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