The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2005
Filed:
Jan. 25, 2002
Tohru Takahashi, Saitama, JP;
Masatsugu Inoue, Kumagaya, JP;
Kumio Fukuda, Fukaya, JP;
Masaru Nikaido, Yokosuka, JP;
Hitoshi Shiozawa, Honjo, JP;
Akiyoshi Nakamura, Saitama, JP;
Satoshi Ishikawa, Fukaya, JP;
Tohru Takahashi, Saitama, JP;
Masatsugu Inoue, Kumagaya, JP;
Kumio Fukuda, Fukaya, JP;
Masaru Nikaido, Yokosuka, JP;
Hitoshi Shiozawa, Honjo, JP;
Akiyoshi Nakamura, Saitama, JP;
Satoshi Ishikawa, Fukaya, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A shadow mask is arranged to face a phosphor screen formed on an inner surface of a panel. A plurality of aperture columns are formed in parallel in the shadow mask. Each aperture column includes a plurality of apertures arranged in line at a predetermined interval. On both sides of each aperture column on the surface of the shadow mask facing the electron gun, stripe-shaped dielectric layers for acting on electron beams toward the apertures are formed respectively, and extend in substantial parallel with the aperture columns. The shadow mask is manufactured in such a manner that stripe-shaped insulating material layers are formed on the surface of a mask base material facing the electron gun, the mask base material is thereafter shaped into a predetermined shape, and the insulating material layers on the shaped mask are sintered.