The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2005
Filed:
Apr. 11, 2002
Manfred Schneegans, Vaterstetten, DE;
Wolfgang Jäger, Baldham, DE;
Ulrike Bewersdorff-sarlette, Radebeul, DE;
Stephan Wege, Weissig, DE;
Manfred Schneegans, Vaterstetten, DE;
Wolfgang Jäger, Baldham, DE;
Ulrike Bewersdorff-Sarlette, Radebeul, DE;
Stephan Wege, Weissig, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A method for fabricating a semiconductor component includes: deposition of a polysilicon layer on a substrate, deposition of a precursor layer on the polysilicon layer, and deposition of a protective layer on the precursor layer. A crystalline transformation occurs in the precursor layer at a first temperature to form an electrode layer. The layers are patterned to form an electrode stack, and the polysilicon layer is oxidized at a second temperature such that no crystalline transformation occurs in the electrode layer.