The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2005
Filed:
Jan. 19, 2001
Hiroyuki Niwa, Otsu, JP;
Kazutaka Tamura, Otsu, JP;
Masahide Senoo, Takatsuki, JP;
Toray Industries, Inc., Tokyo, JP;
Abstract
The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1)(Rand Rare aromatic rings, and Rrepresents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. Rto Rmay be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2)(Rto Rare each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of Rto Ris an aromatic ring with an electron-donating group. Rto Rmay be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.