The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2005
Filed:
Sep. 17, 2001
Walter Schwarzenbach, Romont, CH;
Bertrand Roessler, Marly, CH;
Pierre Fayet, Lausanne, CH;
Tetra Pak (Suisse) S.A., Romont, CH;
Abstract
In a process for treating a surface with the aid of a glow discharge plasma sustained in a gas of substantially ambient pressure between two electrodes (') unwanted effects of plasma filaments occurring in such a plasma are prevented by positioning the surface () to be treated in an edge region (′) of the plasma. The surface is placed on one side of a plasma space () defined by the electrode faces (′) beyond a pair of aligned edges (′) of the electrode faces (′), at a distance of a few millimeters from these edges (′), and facing these edges (′). The treatment gas or treatment gas mixture is fed to the plasma space () from a second side opposite the edge region (′) in which the surface () to be treated is positioned. During treatment, a substrate () whose one surface () is to be treated is either stationary or is advanced in a direction substantially perpendicular to the electrode faces (′).