The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2005

Filed:

May. 08, 2001
Applicants:

Gopal B. Avinash, New Berlin, WI (US);

John Michael Sabol, Sussex, WI (US);

Francois Serge Nicolas, Wauwatosa, WI (US);

Inventors:

Gopal B. Avinash, New Berlin, WI (US);

John Michael Sabol, Sussex, WI (US);

Francois Serge Nicolas, Wauwatosa, WI (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K009/00 ; G01N023/06 ;
U.S. Cl.
CPC ...
Abstract

A method is provided to automatically determine a structure cancelled image in a dual energy decomposition system. A high energy and a low energy level image of internal anatomy formed of at least first and second types of structure are acquired. A characteristic mask is computed using a gradient mask and a localization mask. A first cancellation parameter is evaluated against the characteristic mask, and a second cancellation parameter is computed based upon the first cancellation parameter. The first or second cancellation parameter is selected from a range in a look-up table determined by an effective kVp used to acquire the high level image and an effective kVp used to acquire the low level image. An image of soft structure and an image of hard structure are obtained from the first and second energy level images according to a cancellation equation using the first and second cancellation parameters.


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