The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Jun. 03, 2003
Eric L. Nikkel, Philomath, OR (US);
Mickey Szepesi, Salem, OR (US);
Sadiq Bengali, Corvallis, OR (US);
Michael G. Monroe, Corvallis, OR (US);
Stephen J Potochnik, Corvallis, OR (US);
Eric L. Nikkel, Philomath, OR (US);
Mickey Szepesi, Salem, OR (US);
Sadiq Bengali, Corvallis, OR (US);
Michael G. Monroe, Corvallis, OR (US);
Stephen J Potochnik, Corvallis, OR (US);
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
A method of forming a MEMS device includes providing a substructure including a base material and at least one conductive layer formed on a first side of the base material, forming a dielectric layer over the at least one conductive layer of the substructure, forming a protective layer over the dielectric layer, defining an electrical contact area for the MEMS device on the protective layer, and forming an opening within the electrical contact area through the protective layer and the dielectric layer to the at least one conductive layer of the substructure.