The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2005

Filed:

Jul. 03, 2003
Applicants:

Paul Michael Perozek, Cincinnati, OH (US);

Wayne Lee Lawrence, Sardinia, OH (US);

Inventors:

Paul Michael Perozek, Cincinnati, OH (US);

Wayne Lee Lawrence, Sardinia, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23K026/06 ;
U.S. Cl.
CPC ...
Abstract

A laser shock peening apparatus includes a laser unit for generating at least one laser beam aimed at a laser shock peening area and an anti-feedback means for preventing electromagnetic radiation reflections from the target area from entering the laser unit during laser shock peening and the anti-feedback means is located between the laser unit and a final focusing lens. The anti-feedback means may include an optical isolator at an output of the laser unit such as a faraday isolator. Alternative optical isolators may include thin film polarizers, glan prism polarizers, independent pig tailed optical isolators, mirrors with enhanced P or S polarization coatings. The laser unit may include an oscillator and a final amplifier and the output of the laser unit located after the final amplifier.


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