The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2005

Filed:

May. 18, 2004
Applicants:

Herbert A. Gartner, Baden-Baden, DE;

Steven W. Mork, Midland, MI (US);

Heike Herr, Achern, DE;

Reed A. Shick, Midland, MI (US);

John Klier, Midland, MI (US);

Christopher J. Tucker, Midland, MI (US);

Inventors:

Herbert A. Gartner, Baden-Baden, DE;

Steven W. Mork, Midland, MI (US);

Heike Herr, Achern, DE;

Reed A. Shick, Midland, MI (US);

John Klier, Midland, MI (US);

Christopher J. Tucker, Midland, MI (US);

Assignee:

Dow Global Technologies Inc., Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J020/26 ; B01J020/32 ; C08J003/24 ; C08L033/02 ;
U.S. Cl.
CPC ...
Abstract

The present invention refers to a high internal phase polyelectrolyte emulsions which are useful for the manufacture of superabsorbent polymers having two phases: i) a continuous oil phase and the ii) a dispersed aqueous phase containing the aqueous monomer solution prior to polymerization and the polyelectrolyte in water-soluble, or water-swellable or very slightly crosslinked form after polymerization, wherein the polymerization occurs in the dispersed aqueous phase and wherein the dispersed aqueous phase contains a high concentration of polyelectrolyte. The present invention also refers to a process for preparing such emulsions and for inverting these emulsions so as to form films or other patterns of the superabsorbent polymer. Absorbent structures containing SAP films or other patterns prepared by the present invention are also contemplated.


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