The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
May. 14, 2002
Applicants:
Masaki Yoshizawa, Kanagawa, JP;
Shigeru Moriya, Kanagawa, JP;
Kumiko Oguni, Kanagawa, JP;
Inventors:
Assignee:
Sony Corporation, , JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ; G03C005/00 ;
U.S. Cl.
CPC ...
Abstract
A mask for fabrication of semiconductor devices in which the membrane layer keeps high strength and is free of stress and distortion even though it is made thin. The mask has a membrane-supporting layer at the peripheral part of the mask pattern or the mask pattern region in the membrane layer constituting the mask.
Yoshizawa, Masaki. (2005). Mask for fabrication of semiconductor devices, process for production of the same, and process for fabrication of semiconductor devices (U.S. Patent No. 6916582). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6916582
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile