The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Jun. 05, 2001
Daniel J. Woodruff, Kalispell, MT (US);
Kyle M. Hanson, Kalispell, MT (US);
Steve L. Eudy, Bigfork, MT (US);
Curtis A. Weber, Columbia Falls, MT (US);
Randy Harris, Kalispell, MT (US);
Daniel J. Woodruff, Kalispell, MT (US);
Kyle M. Hanson, Kalispell, MT (US);
Steve L. Eudy, Bigfork, MT (US);
Curtis A. Weber, Columbia Falls, MT (US);
Randy Harris, Kalispell, MT (US);
Semitool, Inc., Kalispell, MT (US);
Abstract
An electrochemical processing chamber which can be modified for treating different workpieces and methods for so modifying electrochemical processing chambers. In one particular embodiment, an electrochemical processing chamberincludes a plurality of wallsdefining a plurality of electrode compartments, each electrode compartment having at least one electrodetherein, and a virtual electrode unitdefining a plurality of flow conduits, with at least one of the flow conduits being in fluid communication with each of the electrode compartments. This first virtual electrode unitmay be exchanged for a second virtual electrode unit, without modification of any of the electrodes, to adapt the processing chamberfor treating a different workpiece.