The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Oct. 26, 2001
Michel Moisan, Outremont, CA;
Zakrzewski Zenon, Gdansk, PL;
Danielle Keroack, St Jean sur Richelieu, CA;
Jean-christophe Rostaing, Versailles, FR;
Michel Moisan, Outremont, CA;
Zakrzewski Zenon, Gdansk, PL;
Danielle Keroack, St Jean sur Richelieu, CA;
Jean-Christophe Rostaing, Versailles, FR;
Abstract
Provided is a device for the microwave-sustained plasma treatment of gases, which comprises a hollow structure forming a waveguide intended to be connected to a microwave generator, and means for making the gas to be treated flow through the said structure in a region in which the amplitude of the electric field associated with the incident wave is high. The means for making the gas flow comprise a plasma torch for producing a plasma in the gas. The torch comprises an injector made of an electrically conducting material mounted on a first large face of the said structure and extending so as to project through an orifice made in a second large face opposite the said first large face. A gap for passage of the incident waves lies around the injector.